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NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT AND MANUFACTURING METHOD OF NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT

机译:基于氮化物的半导体激光元件及制造方法

摘要

PROBLEM TO BE SOLVED: To provide a nitride-based semiconductor laser element capable of implementing WPE improvement and deterioration suppression of reliability property.;SOLUTION: A nitride-based semiconductor laser element 100 comprises: a substrate 1; a first conductivity type clad layer 3 disposed at an upper side of the substrate and consisting of a nitride-based semiconductor material; a luminescent layer disposed at an upper side of the first conductivity type clad layer 3 and consisting of a nitride-based semiconductor material; a second conductivity type semiconductor layer disposed at an upper side of the luminescent layer and consisting of a nitride-based semiconductor material; and a current constriction part 140 disposed at a lateral side of the first conductivity type clad layer 3. The current constriction part 140 includes a cavity that is disposed between the luminescent layer and the substrate 1.;SELECTED DRAWING: Figure 1A;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:提供一种能够实现WPE的改善和可靠性的劣化抑制的氮化物基半导体激光元件。解决方案:氮化物基半导体激光元件100包括:基板1;第一导电类型覆盖层3,其设置在基板的上侧并且由氮化物基半导体材料组成;发光层设置在第一导电类型覆盖层3的上侧并且由氮化物基半导体材料构成;第二导电型半导体层设置在发光层的上侧并且由氮化物基半导体材料组成;电流限制部分140包括设置在发光层和衬底1之间的腔。电流选择部分140包括位于发光层和衬底1之间的腔。选择的附图:图1A;版权:( C)2018,日本特许厅

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