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Two-stage model of nanocone formation on a surface of elementary semiconductors by laser radiation

机译:激光辐射在基本半导体表面形成纳米锥的两阶段模型

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摘要

In this work, we study the mechanism of nanocone formation on a surface of elementary semiconductors by Nd:YAG laser radiation. Our previous investigations of SiGe and CdZnTe solid solutions have shown that nanocone formation mechanism is characterized by two stages. The first stage is characterized by formation of heterostructure, for example, Ge/Si heterostructure from SiGe solid solutions, and the second stage is characterized by formation of nanocones by mechanical plastic deformation of the compressed Ge layer on Si due to mismatch of Si and Ge crystalline lattices. The mechanism of nanocone formation for elementary semiconductors is not clear until now. Therefore, the main goal of our investigations is to study the stages of nanocone formation in elementary semiconductors. A new mechanism of p-n junction formation by laser radiation in the elementary semiconductor as a first stage of nanocone formation is proposed. We explain this effect by the following way: p-n junction is formed by generation and redistribution of intrinsic point defects in temperature gradient field – the thermogradient effect, which is caused by strongly absorbed laser radiation. According to the thermogradient effect, interstitial atoms drift towards the irradiated surface, but vacancies drift to the opposite direction – in the bulk of semiconductor. Since interstitials in Ge crystal are of n-type and vacancies are known to be of p-type, a n-p junction is formed. The mechanism is confirmed by the appearance of diode-like current–voltage characteristics after i-Ge irradiation crystal by laser radiation. The mechanism in Si is confirmed by conductivity type inversion and increased microhardness of Si crystal. The second stage of nanocone formation is laser heating up of top layer enriched by interstitial atoms with its further plastic deformation due to compressive stress caused by interstitials in the top layer and vacancies in the buried layer.
机译:在这项工作中,我们研究了Nd:YAG激光辐射在基本半导体表面形成纳米锥的机理。我们先前对SiGe和CdZnTe固溶体的研究表明,纳米锥的形成机理分为两个阶段。第一阶段的特征在于由SiGe固溶体形成异质结构,例如Ge / Si异质结构,第二阶段的特征在于由于Si和Ge的不匹配而使压缩的Ge层在Si上机械塑性变形而形成纳米锥。晶格。到目前为止,用于基本半导体的纳米锥形成机理尚不清楚。因此,我们研究的主要目标是研究基本半导体中纳米锥形成的阶段。提出了一种通过激光辐射在基本半导体中形成p-n结的新机制,作为纳米锥形成的第一阶段。我们通过以下方式解释这种效应:p-n结是由温度梯度场中本征点缺陷的产生和重新分布形成的-热梯度效应,这是由强烈吸收的激光辐射引起的。根据热梯度效应,间隙原子朝着被辐射的表面漂移,但是空位向相反的方向漂移-在整个半导体中。由于Ge晶体中的间隙是n型的,并且空位是p型的,所以形成了n-p结。通过激光辐照i-Ge辐照晶体后出现类似二极管的电流-电压特性,可以证实其机理。 Si的机理可通过导电类型反转和提高Si晶体的显微硬度来证实。纳米锥形成的第二阶段是激光加热被间隙原子富集的顶层,由于顶层中的间隙和掩埋层中的空位引起的压缩应力,其进一步的塑性变形。

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