首页> 外国专利> NITRIDE-BASED SEMICONDUCTOR WAFER, NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT, AND METHOD OF MANUFACTURING NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT

NITRIDE-BASED SEMICONDUCTOR WAFER, NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT, AND METHOD OF MANUFACTURING NITRIDE-BASED SEMICONDUCTOR LASER ELEMENT

机译:基于氮化物的半导体晶片,基于氮化物的半导体激光元件以及制造基于氮化物的半导体激光元件的方法

摘要

PROBLEM TO BE SOLVED: To provide a nitride-based semiconductor laser element that allows reduction in cost while suppressing the degradation of its reliability.;SOLUTION: A nitride-based semiconductor laser element includes: an n-type GaN substrate 301; a nitride semiconductor layer 20 that is formed on the n-type GaN substrate 301; a waveguide 30 that is formed on the nitride semiconductor layer 20 and extends in a predetermined direction; a pair of side end faces that are parallel to the waveguide 30; a p-side pad electrode 13 that is formed on the nitride semiconductor layer 20 and is for supplying a current to the waveguide 30; and marker portions 320 and 330 for discriminating the kind of a nitride-based semiconductor laser element.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种在降低成本的同时抑制其可靠性下降的氮化物基半导体激光元件。解决方案:氮化物基半导体激光元件包括:n型GaN衬底301;在n型GaN衬底301上形成的氮化物半导体层20;在氮化物半导体层20上形成并沿预定方向延伸的波导30。一对与波导30平行的侧面。 p侧焊盘电极13,其形成在氮化物半导体层20上并用于向波导30提供电流。标记部分320和330用于区分氮化物基半导体激光元件的种类。;版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2013051445A

    专利类型

  • 公开/公告日2013-03-14

    原文格式PDF

  • 申请/专利权人 SHARP CORP;

    申请/专利号JP20120267311

  • 申请日2012-12-06

  • 分类号H01S5/343;

  • 国家 JP

  • 入库时间 2022-08-21 16:59:40

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