首页> 外国专利> SOLUBLE COPPER ANODE, ELECTROLYTIC COPPER PLATING APPARATUS, ELECTROLYTIC COPPER PLATING METHOD, AND STORAGE METHOD OF ACIDIC ELECTROLYTIC COPPER PLATING LIQUID

SOLUBLE COPPER ANODE, ELECTROLYTIC COPPER PLATING APPARATUS, ELECTROLYTIC COPPER PLATING METHOD, AND STORAGE METHOD OF ACIDIC ELECTROLYTIC COPPER PLATING LIQUID

机译:可溶性铜阳极,电解铜镀覆设备,电解铜镀覆方法和酸性电解铜镀覆液体的储存方法

摘要

PROBLEM TO BE SOLVED: To provide a soluble copper anode, an electrolytic copper plating apparatus, an electrolytic copper plating method, and a storage method of an acidic electrolytic copper plating liquid, which can stably suppress production of an anode sludge.SOLUTION: A soluble copper anode that is used for electrolytic copper plating adopts a soluble copper anode that includes a titanium case for housing a copper material and an iridium oxide member in contact with the titanium case. Here, in the iridium oxide member, at least a surface material is an iridium oxide simple substance or an iridium oxide composite, and thereby production of an anode sludge can be suppressed, and the plating property is not degraded.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种可稳定地抑制阳极污泥产生的可溶性铜阳极,电解铜电镀装置,电解铜电镀方法以及酸性电解铜电镀液的储存方法。用于电解镀铜的铜阳极采用可溶性铜阳极,该可溶性铜阳极包括用于容纳铜材料的钛壳和与钛壳接触的氧化铱构件。在此,在氧化铱构件中,至少表面材料是氧化铱单质或氧化铱复合材料,因此可以抑制阳极淤渣的产生,并且镀覆性能不会降低。选定的附图:图1

著录项

  • 公开/公告号JP2017210644A

    专利类型

  • 公开/公告日2017-11-30

    原文格式PDF

  • 申请/专利权人 MELTEX INC;

    申请/专利号JP20160103651

  • 发明设计人 KIYOTA MASARU;SHIGEMATSU TOSHIYUKI;

    申请日2016-05-24

  • 分类号C25D17/12;C25D17/10;C25D5/18;C25D7;C25D7/12;C25D21;

  • 国家 JP

  • 入库时间 2022-08-21 13:10:52

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