Material deposition system and method for depositing material in a material deposition system

摘要

A vacuum deposition system (300; 400; 500) for depositing material on a substrate (121) is described. The vacuum deposition system (300; 400; 500) includes a vacuum chamber (110) having a chamber volume and a material deposition apparatus (100) for providing a material to be deposited, the vacuum chamber (110) being deposited. And a material deposition apparatus (100) disposed therein. The vacuum deposition system further includes a substrate support (126; 600) for supporting a substrate (121) having a substrate size within the vacuum chamber (110). The ratio of the chamber volume to the substrate size is 15 m or less. Further described is a method of depositing material on a substrate (121) in a vacuum deposition system (300; 400; 500). [Selection] Figure 1a