High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

摘要

A high-throughput multi-plume pulsed-laser deposition(MPPLD) system has been demonstrated and compared to previous techniques. Whereas most com binatorial pulsedlaser deposition(PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-fllm fabrication.