Electrode for plasma CVD film forming apparatus, method for producing electrode, plasma CVD film forming apparatus and method for producing functional film

摘要

Electrode for plasma CVD film forming apparatus which suppresses arc discharge and suppress decrease of film forming rate and has high productivity, method for producing the electrode, plasma CVD film forming apparatus provided with the electrode, and plasma CVD forming apparatus A method for producing a functional film using a membrane device is provided. (31) having dielectric layers (37), (38) containing alumina and titania in a mass ratio of alumina / titania = 80 / 20-40 / 60 on the surface Electrodes (39), (40). Also, this method is a method for manufacturing the electrode by the plasma spraying method. Further, it is a plasma CVD film forming apparatus (31) including the electrode. Further, the present invention is a method for producing a functional film on which a functional film (3) is formed on a substrate film (2) by using the plasma CVD film forming apparatus.