首页> 外国专利> Vertical Ferroelectric Field Effect Transistor Constructions, Constructions Comprising A Pair Of Vertical Ferroelectric Field Effect Transistors, Vertical Strings Of Ferroelectric Field Effect Transistors, And Vertical Strings Of Laterally Opposing Pairs Of Vertical Ferroelectric Field Effect Transistors

Vertical Ferroelectric Field Effect Transistor Constructions, Constructions Comprising A Pair Of Vertical Ferroelectric Field Effect Transistors, Vertical Strings Of Ferroelectric Field Effect Transistors, And Vertical Strings Of Laterally Opposing Pairs Of Vertical Ferroelectric Field Effect Transistors

机译:垂直铁电场效应晶体管结构,包括一对垂直铁电场效应晶体管的结构,垂直的铁电场效应晶体管串,以及横向相对的垂直铁电场效应晶体管对的垂直串

摘要

A vertical ferroelectric field effect transistor construction comprises an isolating core. A transition metal dichalcogenide material encircles the isolating core and has a lateral wall thickness of 1 monolayer to 7 monolayers. A ferroelectric gate dielectric material encircles the transition metal dichalcogenide material. Conductive gate material encircles the ferroelectric gate dielectric material. The transition metal dichalcogenide material extends elevationally inward and elevationally outward of the conductive gate material. A conductive contact is directly against a lateral outer sidewall of the transition metal dichalcogenide material that is a) elevationally inward of the conductive gate material, or b) elevationally outward of the conductive gate material. Additional embodiments are disclosed.
机译:垂直铁电场效应晶体管构造包括隔离芯。过渡金属二硫化碳材料环绕隔离芯,侧壁厚度为1个单层到7个单层。铁电栅极介电材料环绕过渡金属二卤化碳材料。导电栅极材料环绕铁电栅极介电材料。过渡金属二卤化碳材料从导电栅极材料向内垂直向上延伸。导电触点直接抵靠过渡金属二卤化氢材料的横向外侧壁,该侧壁是a)垂直于导电栅极材料的内部,或b)垂直于导电栅极材料的外部的。公开了其他实施例。

著录项

  • 公开/公告号US2018323214A1

    专利类型

  • 公开/公告日2018-11-08

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201816020712

  • 申请日2018-06-27

  • 分类号H01L27/11597;H01L29/49;H01L27/11585;H01L21/28;H01L29/51;H01L27/1157;H01L29/24;H01L29/423;H01L29/66;H01L29/786;H01L27/11582;

  • 国家 US

  • 入库时间 2022-08-21 12:56:39

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