首页> 外国专利> Method for generating an electronic circuit for modeling the effects of substrate coupling in an integrated circuit

Method for generating an electronic circuit for modeling the effects of substrate coupling in an integrated circuit

机译:产生用于对集成电路中的衬底耦合的影响进行建模的电子电路的方法

摘要

Method for generating an electrical circuit comprising at least one network of diodes, resistors and / or homounions, modeling the parasitic effects of a substrate of an integrated circuit comprising electronic devices, said circuit being defined by a set of arrangements of mask layers and a file of technological rules, the method comprising: * generating (13) a simplified 3D arrangement of said integrated circuit from the set of mask layer arrangements and the file of technological rules only through the use of layers of masks associated with the technological layers involved in parasitic effects; * define (15) in the simplified 3D arrangement a plurality of internal regions, each internal region corresponding to an electronic device of the integrated circuit and an external region corresponding to the part of the simplified 3D arrangement not included in any internal region; * calculate (17, 19) in parallel and independently: * for each internal region, a 3D matrix of adjacent rectangular cuboids, so that there is a boundary between at least two adjacent rectangular cuboids where there is a change of type of doped or where there is a change in the concentration of the doped in the simplified arrangement; * for the external region, a mesh of adjacent rectangular cuboids without overlaps and without spaces; * extract (21) a parasitic component with two terminals between each pair of adjacent cuboids, each terminal being positioned in the center of one of the two adjacent cuboids, so that: * if the two adjacent cuboids have two different types of doped, the parasitic component is defined as a diode; and * if the two adjacent cuboids have the same type of doped with the same doped concentration, the parasitic component is defined as a resistance; and * if the two adjacent cuboids have the same type of doped and different concentrations, the parasitic component is defined as a homounion; and * define (23) the electrical characteristics of each parasitic component based on the geometry of the adjacent cuboids and the technological parameters; and * connect (25) all the parasitic components extracted in an electrical circuit by considering each rectangular cuboid center as a node of the network of parasitic components. characterized in that a set of xyz coordinates is applied on the simplified 3D arrangement, in which the x and y coordinates define horizontal planes and the z coordinate defines the depth of the integrated circuit and the 3D matrix of the internal region is calculated by: * scanning (31) the mask layers to find and collect corner points of change in the type of doped or the concentration of the doped; * flatten (33) the corner points at xy coordinates so that a horizontal rectangular tiling is constructed (35, 37, 39) in which each corner point is a corner of at least one rectangle; * build (43) rectangular cuboid layers by projecting the rectangular tiling on the z axis, the depth of each layer corresponding to the depth of at least one corner point.
机译:产生包括至少一个二极管,电阻器和/或均聚网络的电路的方法,对包括电子器件的集成电路的衬底的寄生效应进行建模,所述电路由一组掩模层和文件布置来定义根据技术规则,该方法包括:*仅通过使用与寄生物所涉及的技术层相关联的掩模层,才可以从一组掩模层布置和技术规则文件中生成(13)所述集成电路的简化3D布置效果; *在简化的3D布置中定义(15)多个内部区域,每个内部区域对应于集成电路的电子器件,并且对应于简化的3D布置的一部分中不包括在任何内部区域中的外部区域; *并行且独立地计算(17,19):*对于每个内部区域,一个相邻的矩形长方体的3D矩阵,以便至少两个相邻的矩形长方体之间存在边界,其中掺杂类型发生变化或在简化的布置中,掺杂剂的浓度发生了变化。 *对于外部区域,相邻矩形长方体的网格没有重叠且没有空间; *提取(21)在每对相邻的长方体之间具有两个端子的寄生成分,每个端子位于两个相邻的长方体之一的中心,因此:*如果两个相邻的长方体具有两种不同类型的掺杂,则寄生元件定义为二极管; *如果两个相邻的长方体具有相同的掺杂类型和相同的掺杂浓度,则将寄生分量定义为电阻; *如果两个相邻的长方体具有相同类型的掺杂且浓度不同,则寄生成分定义为均聚; *根据相邻长方体的几何形状和工艺参数定义(23)每个寄生元件的电气特性; *通过将每个矩形长方体中心视为寄生元件网络的节点,连接(25)在电路中提取的所有寄生元件。其特征在于,一组xyz坐标应用于简化的3D布置,其中x和y坐标定义水平面,而z坐标定义集成电路的深度,内部区域的3D矩阵计算如下:*扫描(31)掩模层以发现并收集掺杂类型或掺杂浓度变化的拐角点; *将角点在xy坐标处展平(33),以便构造水平矩形拼贴(35、37、39),其中每个角点是至少一个矩形的角; *通过在z轴上投影矩形拼贴来构建(43)矩形长方体层,每层的深度对应于至少一个角点的深度。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号