METHOD FOR FORMING THIN FILM AND METHOD FOR FORMING ALUMINIUM NITRIDE THIN FILM

摘要

A method for forming a thin film and a method for forming an aluminium nitride thin film. Two pre-sputtering processes having different process parameters are performed before primary sputtering to achieve the effect of stabilizing the status of a target. The method for forming a thin film can form an aluminium nitride thin film on a substrate, and the aluminium nitride thin film can be applied to a buffer layer between the substrate and a gallium nitride layer in an electronic device.