首页> 外国专利> Thin film e.g. gallium nitride thin film, transferring method for e.g. microwave field, involves forming adhesion layer on substrate, and thinning substrate by breaking at fragile area created by fragilization of substrate to form thin film

Thin film e.g. gallium nitride thin film, transferring method for e.g. microwave field, involves forming adhesion layer on substrate, and thinning substrate by breaking at fragile area created by fragilization of substrate to form thin film

机译:薄膜例如氮化镓薄膜,例如微波场涉及在基材上形成粘附层,并通过在基材脆化产生的易碎区域处破裂而减薄基材以形成薄膜

摘要

The method involves forming an adhesion layer made of nitride on a surface (40) of a substrate (30) made of III-V type material. A bonding layer made of oxide is formed on the adhesion layer. The substrate, adhesion layer and bonding layer are assembled on another substrate. The substrate (30) is thinned by breaking at the level of buried fragile area created by a fragilization of the substrate (30) to form a thin film. An independent claim is also included for a material structure comprising a substrate.
机译:该方法包括在由III-V型材料制成的基板(30)的表面(40)上形成由氮化物制成的粘合层。在粘合层上形成由氧化物制成的粘合层。基板,粘附层和粘结层被组装在另一基板上。通过在由基板(30)的脆化而产生的掩埋的易碎区域的水平处断裂来减薄基板(30)以形成薄膜。对于包括衬底的材料结构也包括独立权利要求。

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