PROJECTION EXPOSURE SYSTEM AND METHOD FOR REDUCING DEFORMATIONS OF COMPONENTS OF THE PROJECTION EXPOSURE SYSTEM CAUSED BY DYNAMIC ACCELERATIONS

摘要

The invention relates to a projection exposure system (1) for semiconductor lithography, comprising at least one component (22) and a support device having at least one support actuator (23) which acts on at least one support point (27) of the component (22) in such a way that deformations of the component (22) are reduced, wherein the support device has a control unit (28) for actuating the at least one support actuator (23), wherein the control unit (28) is configured to actuate the support actuator (23) during a dynamic acceleration acting on the component (22). The invention also relates to a method for reducing deformations of components of a projection exposure system for semiconductor lithography caused by dynamic accelerations.