Gas Module for Atomic Layer Deposition Apparatus Atomic Layer Deposition Apparatus Deposition Method using the same

摘要

Provided is a gas module for atomic layer deposition equipment. The gas module for atomic layer deposition equipment according to an embodiment of the present invention includes: a first-type gas supply portion for sequentially supplying a plurality of gas in accordance with an atomic layer deposition mode toward a substrate, or supplying single gas; and a plurality of second-type gas supply portions disposed at opposite ends in the direction of the substrate with respect to the first-type gas supply portion, and supplying single gas.