DECOMPRESSION DRYING APPARATUS AND DECOMPRESSION DRYING METHOD

摘要

An object of the present invention is to provide a decompression drying apparatus capable of reducing unevenness in the decompression drying speed of a coating layer in the plane of a substrate. The decompression drying apparatus includes a processing chamber for accommodating a substrate on which a coating layer containing an organic material and a solvent is formed; a substrate holding part for holding the substrate from the inside of the processing chamber to a lower part; a decompression mechanism connected to the exhaust port of the processing chamber to decompress the inside of the processing chamber; and an airflow restricting part for restricting an airflow directed from the vicinity of the upper surface of the substrate held by the substrate holding part to the exhaust port of the processing chamber. The airflow restricting part includes a side wall part that blocks the airflow at the side of the substrate held by the substrate holding part and a ceiling part that blocks the airflow at the upper part of the substrate held by the substrate holding part.