DECOMPRESSION DRYING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND DECOMPRESSION DRYING METHOD

摘要

To provide a technique for performing a decompression processing at a decompression speed near to a desired decompression speed in a decompression drying device.SOLUTION: A decompression drying device 1 houses a substrate to which a processing liquid is adhered into a chamber, and dries the substrate by decompressing in the chamber. The decompression drying device 1 includes: the chamber; a decompression exhaust part; a valve 45 that adjusts a flow amount of the decompression exhaust; a target setting part 61 to which target data S61 is set; a table data acquisition part 62 that acquires table data S62 indicating a relationship between a pressure in the chamber due to the decompression exhaust and a reach time to the pressure in each predetermined valve opening level; an opening level determination part 63 that determines a valve opening level S63 at the time of executing a decompression dry processing on the basis of the table data S62 and the target data S61; and an operation control part 64 that controls the valve opening level. Thus, the decompression processing can be performed at the decompression speed near to a desired decompression speed in regardless of an individual difference of a device and a setting environment.SELECTED DRAWING: Figure 3