PRE-DISPENSE HOME PORT, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF PROCESSING SUBSTRATE USING SAME

摘要

The present invention provides a substrate processing apparatus which includes: a heating chuck including a heater capable of supporting a substrate and heating the substrate; a chemical liquid supply nozzle configured to supply chemical liquid to an upper surface of the substrate; a pre-dispense home port having an opened upper portion for containing non-steady chemical liquid pre-dispensed from the chemical liquid supply nozzle; and a processing chamber for containing the heating chuck, the pre-dispense home port, and the chemical liquid supply nozzle. The pre-dispense home port includes a cover portion covering the opened upper portion, where the cover portion has an opening for receiving the chemical liquid supply nozzle. According to the present invention, when the substrate processing apparatus and the pre-dispense home port are used, the generation of particles may be reduced and the defect rate may be reduced, so that the substrate may be heated without overheating and deformation of the apparatus for a relatively long time, thereby improving the productivity.;COPYRIGHT KIPO 2018