Apparatus and system for vacuum deposition on a substrate, and method for vacuum deposition on a substrate

摘要

The present disclosure provides an apparatus (100) for vacuum deposition on a substrate (10). The apparatus 100 includes a vacuum chamber 110 having a first region 112 and a first deposition region 114; One or more deposition sources 120 in the first deposition region 114-the one or more deposition sources 120 may be arranged such that at least the first substrate 10 passes through the one or more deposition sources 120 in a first transport direction Is configured for vacuum deposition on at least the first substrate (10) while being transported along the substrate (1); And a first substrate transfer unit 140 in a first region 112 wherein the first substrate transfer unit 140 is configured to transfer at least the first substrate 10 to a first transfer region In the first track switch direction (4).