Method for manufacturing spin coating based high quality solution-processed boron nitride thin film and its application in electronic devices

摘要

The present invention relates to a method for manufacturing a high-quality boron nitride (BN) thin film based on a solution process and a method for applying the same to a device, and more specifically, to a method for forming a high-quality BN thin film on various substrates based on a large area by dissolving BN powder in a solvent using a solution process instead of a conventional method for growing a thin film using complex and expensive vacuum equipment, wherein, in a process of manufacturing a high-quality BN thin film, the high-quality BN thin film is made of a two-dimensional nanostructure electronic material. According to the present invention, a BN thin film manufactured by using a solution process can be formed while including advantages of the solution process, thereby enabling large-area deposition and a low-temperature process with a heat treatment temperature less than 100°C, reducing process costs, and having excellent characteristics compared to a CVD growth method in terms of energy efficiency.