Method for manufacturing spin coating based high quality solution-processed boron nitride thin film and its application in electronic devices

摘要

The present invention relates to a solution process-based high quality boron nitride thin film (BN thin film) manufacturing method and a device application method, a high-quality boron nitride (BN) thin film manufacturing process, a two-dimensional nanostructure electronic material material is a conventional complex and expensive Instead of using vacuum equipment to grow thin films, BN powder is dissolved in a solvent using a solution process to produce high quality boron nitride thin films on various substrates based on large area. It relates to a method of forming. Boron nitride (BN) fabricated using the solution process enables the formation of a BN thin film while including the advantages of the solution process, so that large-area deposition is possible, and a low temperature process temperature and a process cost of less than 100 ^° C. It can be lowered and has superior characteristics compared to the CVD growth method in terms of energy efficiency.