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PIXEL FOR UNCOOLED INFRARED FOCAL PLANE DETECTOR AND PREPARATION METHOD THEREFOR

机译:用于非冷红外焦平面探测器的像素及其制备方法

摘要

An pixel for an uncooled infrared focal plane detector and a preparation method therefor, which relate to the technical field of uncooled infrared focal plane detectors. The pixel for an uncooled infrared focal plane detector comprises a structure of three layers, which are sequentially located on a semiconductor substrate (1) from bottom to top. The first layer of a bridge structure comprises a metal reflection layer (2), an insulation dielectric layer (4), a first supporting layer (6), a first support layer protection layer (7), a first metal electrode layer (9), and a first silicon nitride dielectric layer (10). The second layer of a thermal conversion structure comprises a second support layer (11), a second support layer protection layer (12), a thermal sensitive layer (17), a thermal sensitive layer production layer (18), a second metal electrode layer (14), and a second silicon nitride dielectric layer (15). The third layer of an absorption structure comprises a third support layer (19), an absorption layer (20), and an absorption layer protection layer (21). The pixel for an uncooled infrared focal plane detector can obviously improve the absorption rate of infrared radiation and can improve the response rate of a detector, thereby laying a foundation for manufacturing larger-array and smaller-pixel detectors.
机译:一种非制冷红外焦平面探测器的像素及其制备方法,涉及非制冷红外焦平面探测器的技术领域。用于未冷却的红外焦平面检测器的像素包括三层的结构,其从下到上依次位于半导体衬底(1)上。桥接结构的第一层包括金属反射层(2),绝缘介电层(4),第一支撑层(6),第一支撑层保护层(7),第一金属电极层(9) ;和第一氮化硅介电层(10)。热转换结构的第二层包括第二支撑层(11),第二支撑层保护层(12),热敏层(17),热敏层产生层(18),第二金属电极层(14),以及第二氮化硅介电层(15)。吸收结构的第三层包括第三支撑层(19),吸收层(20)和吸收层保护层(21)。未冷却的红外焦平面探测器的像素可以明显提高红外辐射的吸收率,并可以提高探测器的响应率,从而为制造大阵列和小像素探测器奠定了基础。

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