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Outflow cell, vapor deposition system including the outflow cell, and related method

机译:流出池,包括流出池的气相沉积系统以及相关方法

摘要

The effusion cell is a weir for containing the material to be vaporized or sublimated, a delivery tube configured to deliver the vaporized or sublimated material resulting from the weir to the chamber, and a feed tube extending from the weir The feed tube captures condensation arising from the vaporized or sublimated material and the feed tube is arranged and configured to send the condensation back to the crucible, and the material in the crucible is heated to And at least one heating element arranged and configured to cause the vaporized or sublimed material flow through the delivery tube and the delivery from the outflow cell. The effusion cell is configured such that the crucible can be filled with the material to be vaporized or sublimated without removing the effusion cell from the process vacuum chamber. The semiconductor substrate processing system can include such an effusion cell. [Selected figure] Figure 4
机译:渗出池是用于容纳待汽化或升华的材料的堰,配置成将来自堰的汽化或升华的材料输送至腔室的输送管,以及从堰延伸的进料管。汽化或升华的材料和进料管的布置和构造将冷凝物送回坩埚,并将坩埚中的物料加热到,并且至少一个加热元件布置和构造成使汽化或升华的材料流过坩埚。输送管和流出池的输送。积液池被构造成使得坩埚可以被填充有待汽化或升华的材料,而无需从处理真空室移除积液池。半导体衬底处理系统可以包括这种渗出单元。 [选定图]图4

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