Sputtering apparatus, sputtering film deposition method, and manufacturing method of laminated film and electrode substrate film

摘要

PROBLEM TO BE SOLVED: To provide a sputtering apparatus and sputtering deposition method, etc., capable of applying a DC power supply having a recovery function during abnormal discharge and inspecting the film deposition state of a film during deposition.SOLUTION: Means for conveying a long-sized body 12, a cooling can roll 16, first sputtering cathodes 17, 18, second sputtering cathodes 19, 20 and gas discharge pipes 25-32 for supplying a reactive gas are included in a vacuum chamber 10. In the sputtering apparatus for supplying electric power from a DC power supply to each sputtering cathode to perform sputtering and having a recovery function during abnormal discharge, reflection type laser sensors 33, 34 for inspecting the film deposition state of the film deposited on the long-sized body are attached at downstream side positions of the first sputtering cathodes and/or the second sputtering cathodes in the vicinity of the outer peripheral surface of the cooling can roll.SELECTED DRAWING: Figure 5