Non-chemically amplified resist composition, non-chemically amplified resist film, pattern formation method, and electronic device manufacturing method

摘要

Provided are a non-chemical amplification type resist composition in which the resolving power in an isolated line pattern or an isolated space pattern is excellent, and a non-chemical amplification type resist film, a pattern forming method, and a method for manufacturing an electronic device. The non-chemical amplification type resist composition contains a resin (Ab) having a metal salt structure.