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Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process
Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process
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机译:预测线宽粗糙度和抗蚀剂图案故障的方法,程序产品和设备及其在光刻仿真过程中的用途
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摘要
A method of generating a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; defining a first model representing the imaging performance of the optical imaging system and the process, and calibrating the model, where the first model generates values corresponding to a latent image slope. The method further includes the step of defining a second model for estimating a line width roughness of a feature to be imaged, where the second model utilizes the latent image slope values to estimate the line width roughness.
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