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Nanowire field effect transistor having a metal gate surrounding semiconductor nanowire

机译:具有围绕半导体纳米线的金属栅极的纳米线场效应晶体管

摘要

A device includes a substrate, a buffer layer, a nanowire, a gate structure, and a remnant of a sacrificial layer. The buffer layer is above the substrate. The nanowire is above the buffer layer and includes a pair of source/drain regions and a channel region between the source/drain regions. The gate structure surrounds the channel region. The remnant of the sacrificial layer is between the buffer layer and the nanowire and includes a group III-V semiconductor material.
机译:器件包括衬底,缓冲层,纳米线,栅极结构和牺牲层的残余物。缓冲层在基板上方。纳米线在缓冲层上方,并且包括一对源/漏区和在源/漏区之间的沟道区。栅极结构围绕沟道区。牺牲层的残余物在缓冲层和纳米线之间,并且包括III-V族半导体材料。

著录项

  • 公开/公告号US10276660B2

    专利类型

  • 公开/公告日2019-04-30

    原文格式PDF

  • 申请/专利权人 TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.;

    申请/专利号US201815896269

  • 发明设计人 RICHARD KENNETH OXLAND;

    申请日2018-02-14

  • 分类号H01L29/06;H01L29/10;H01L29/78;H01L29/66;B82Y10;B82Y40;H01L29/423;H01L29/775;H01L21/02;H01L21/285;H01L29/165;H01L29/20;H01L29/205;H01L29/49;H01L29/51;H01L29/786;H01L29/16;H01L21/762;H01L27/088;H01L27/092;H01L27/108;H01L27/12;H01L29/417;H01L29/08;

  • 国家 US

  • 入库时间 2022-08-21 12:13:06

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