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INTERFACIAL CONTROL OF OXYGEN VACANCY DOPING AND ELECTRICAL CONDUCTION IN THIN FILM OXIDE HETEROSTRUCTURES
INTERFACIAL CONTROL OF OXYGEN VACANCY DOPING AND ELECTRICAL CONDUCTION IN THIN FILM OXIDE HETEROSTRUCTURES
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机译:薄膜氧化物异质结构中氧空位掺杂和导电的界面控制
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摘要
Systems and methods of reversibly controlling the oxygen vacancy concentration and distribution in oxide heterostructures consisting of electronically conducting In2O3 films grown on ionically conducting Y2O3-stabilized ZrO2 substrates. Oxygen ion redistribution across the heterointerface is induced using an applied electric field oriented in the plane of the interface, resulting in controlled oxygen vacancy (and hence electron) doping of the film and possible orders-of-magnitude enhancement of the film's electrical conduction. The reversible modified behavior is dependent on interface properties and is attained without cation doping or changes in the gas environment in contact with the sample.
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机译:可逆地控制氧异位结构中氧空位浓度和分布的系统和方法,该结构和方法是在离子导电Y 2 Sub上生长的电子In 2 Sub> O 3 Sub>薄膜组成> O 3 Sub>稳定的ZrO 2 Sub>基质。使用定向在界面平面中的电场,可在整个异质界面上引起氧离子的重新分布,从而可控制薄膜的氧空位(从而电子)掺杂,并可能提高薄膜电导的数量级。可逆的改性行为取决于界面性质,并且在没有阳离子掺杂或与样品接触的气体环境变化的情况下即可实现。
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