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Continuous system for fabricating multilayer heterostructures via hydride vapor phase epitaxy
Continuous system for fabricating multilayer heterostructures via hydride vapor phase epitaxy
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机译:通过氢化物气相外延制造多层异质结构的连续系统
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摘要
A Hydride Vapor Phase Epitaxy (HVPE) system is provided which comprises a deposition assembly comprising a plurality of deposition chambers and a plurality of separation chambers mounted together, each separation chamber having two opposing ends, each end mounted to a deposition chamber of the plurality of deposition chambers and in fluid communication with the deposition chamber via a fluid pathway, wherein each deposition chamber of the plurality of deposition chambers defines a deposition zone having a height hd, each separation chamber defines a separation zone having a height hs and a length ls, and each fluid pathway has a height hfp, wherein hfp, hs and ls are selected to provide a predetermined interfacial transition region value between different material layers of a multilayer heterostructure; and a moveable belt configured to continuously convey a substrate mounted thereon through the plurality of deposition chambers and the plurality of separation chambers. The system further comprises a gas delivery assembly configured to deliver reactant gas mixtures to the deposition assembly for deposition on the substrate via HVPE.
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机译:提供了氢化物气相外延(HVPE)系统,其包括沉积组件,该沉积组件包括多个沉积室和安装在一起的多个分离室,每个分离室具有两个相对的端部,每个端部安装到多个沉积室中的一个沉积室中。沉积室并通过流体路径与沉积室流体连通,其中多个沉积室中的每个沉积室限定具有高度h d Sub>的沉积区,每个分离室限定具有高度h d Sub>的分离区高度h s Sub>和长度l s Sub>,每个流体通道的高度为h fp Sub>,其中h fp Sub选择h, s Sub>和l s Sub>,以在多层异质结构的不同材料层之间提供预定的界面过渡区域值;可移动带,其构造成通过多个沉积室和多个分离室连续地传送安装在其上的基板。该系统还包括气体输送组件,该气体输送组件构造成将反应气体混合物输送到沉积组件,以经由HVPE沉积在基板上。
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