首页> 外国专利> MULTILAYER GRAPHENE QUANTUM CARBON-BASED SEMICONDUCTOR MATERIAL PREPARED FROM PI FILM, AND PREPARATION METHOD THEREFOR

MULTILAYER GRAPHENE QUANTUM CARBON-BASED SEMICONDUCTOR MATERIAL PREPARED FROM PI FILM, AND PREPARATION METHOD THEREFOR

机译:PI膜制备的多层石墨烯量子碳基半导体材料及其制备方法

摘要

A preparation method for a multilayer graphene quantum carbon-based two-dimensional semiconductor material comprises: S1. taking a PI film as a raw material, and performing polymer sintering at a first temperature, to remove H, O and N atoms to form a carbon precursor; and S2. adjusting the temperature to a second temperature, and graphitizing the carbon precursor to form a multilayer graphene quantum carbon-based two-dimensional semiconductor material, wherein in at least the step S2, a nano metal material is doped to form quantum dots in the multilayer graphene. The multilayer graphene quantum carbon-based two-dimensional semiconductor material prepared by the method adopts a hexagonal planar net molecular structure, is orderly arranged, and has flexibility, high tortuosity, and quite low in-plane dispersity and degree of deviation. Band gaps are formed through doping of a nano metal, and the band gaps are controllable.
机译:多层石墨烯量子碳基二维半导体材料的制备方法包括:S1。以PI膜为原料,在第一温度下进行聚合物烧结,去除H,O,N原子,形成碳前驱体。和S2。将温度调节至第二温度,并且将碳前体石墨化以形成多层石墨烯量子碳基二维半导体材料,其中至少在步骤S2中,掺杂纳米金属材料以在多层石墨烯中形成量子点。通过该方法制备的多层石墨烯量子碳基二维半导体材料采用六方平面网状分子结构,排列有序,具有柔韧性,高曲折度,面内分散度和偏斜度相当低。通过掺杂纳米金属形成带隙,并且带隙是可控制的。

著录项

  • 公开/公告号US2019189754A1

    专利类型

  • 公开/公告日2019-06-20

    原文格式PDF

  • 申请/专利权人 SHENZHEN DANBOND TECHNOLOGY CO. LTD;

    申请/专利号US201916282314

  • 发明设计人 PING LIU;

    申请日2019-02-22

  • 分类号H01L29/16;H01L23/532;H01L21/324;H01L29/167;

  • 国家 US

  • 入库时间 2022-08-21 12:09:33

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