首页> 外国专利> VERTICAL NON-VOLATILE MEMORY DEVICE, METHOD OF FABRICATING THE SAME DEVICE, AND ELECTRIC-ELECTRONIC SYSTEM HAVING THE SAME DEVICE

VERTICAL NON-VOLATILE MEMORY DEVICE, METHOD OF FABRICATING THE SAME DEVICE, AND ELECTRIC-ELECTRONIC SYSTEM HAVING THE SAME DEVICE

机译:垂直非挥发性存储器装置,制造该装置的方法以及具有该装置的电子系统

摘要

Provided is a vertical non-volatile memory device having a metal source line. The vertical non-volatile memory device includes cell string units that are formed on first portions of a semiconductor substrate and are vertically arranged with respect to a surface of the semiconductor substrate, impurity regions formed on second portions of the semiconductor substrate between the cell string units, conductive lines formed on the impurity regions, and spacers that are formed on the sidewalls of the cell string units and insulate the conductive lines from the cells string units.
机译:提供一种具有金属源极线的垂直非易失性存储装置。垂直非易失性存储器件包括:单元串单元,其形成在半导体衬底的第一部分上并且相对于半导体衬底的表面垂直布置;杂质区域,形成在单元串单元之间的半导体衬底的第二部分上包括:形成在杂质区域上的导线;以及形成在单元串单元的侧壁上的隔离物,该隔离物使导线与单元串单元绝缘。

著录项

  • 公开/公告号US2019074292A1

    专利类型

  • 公开/公告日2019-03-07

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US201816177566

  • 申请日2018-11-01

  • 分类号H01L27/11582;H01L29/66;H01L27/11578;H01L21/768;H01L21/306;H01L21/285;H01L21/265;G11C16/04;

  • 国家 US

  • 入库时间 2022-08-21 12:04:25

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