Highly perfluorinated positive-tone photoresists being capable of processing with fluorous solvent and preparing method of organic electronic devices using the same

摘要

The present invention relates to a highly fluorinated positive photoresist for being processed as a high fluorine type solvent, and a method for manufacturing an organic electronic device using the same capable of forming a pattern by increasing solubility of a light exposed part in irradiation of ultraviolet rays (UV) when the highly fluorinated positive photoresist for being processed as a high fluorine type solvent is used. After forming a photoresist pattern by using the highly fluorinated positive photoresist for being processed as a high fluorine type solvent and depositing an organic electronic material on the pattern, the present invention can form a fine pattern by using the high fluorine type solvent without an additional additive in a lift-off process or an RIE process. Since the highly fluorinated positive photoresist manufactures the pattern without PAG or subsequent heat treatment, the highly fluorinated positive photoresist can minimize influence for a lower organic electronic material layer even when performing photo patterning on an upper part of the organic electronic material layer. The present invention can manufacture an organic electronic device using a multicolor OLED pixel array patterning process and other organic electronic materials by using the highly fluorinated positive photoresist for being processed as a high fluorine type solvent.