PULSE LASER DEPOSITION EQUIPMENT INCLUDING VACUUM CHAMBER

摘要

The present invention relates to pulse laser deposition equipment including a vacuum chamber, capable of improving productivity in a thin film deposition process. According to the present invention, the pulse laser deposition equipment including a vacuum chamber comprises: a base plate having a first view port formed thereon; the vacuum chamber installed on the upper part of the base plate to maintain a state of being closed from the outside and having a second view port formed on a top to face the first view port; one or more flanges formed in a structure of being installed on one side of the vacuum chamber to communicate with the inside of the vacuum chamber; a laser generation device installed outside the vacuum chamber to generate laser irradiated into the vacuum chamber through the first view port; and a carousel assembly installed in the vacuum chamber, and mounting a statement and a deposition target deposited on the substrate thereon.;COPYRIGHT KIPO 2019