OPCOptical Proximity Correction EUVExtreme ultraviolet radiation Monitoring macro providing method OPC method and EUV mask manufacturing method

摘要

The present invention relates to a monitoring macro method comprising the steps of: generating a first simulation model by performing a first simulation on a sample macro including a plurality of pattern arrays each including a plurality of patterns and spaced apart, aligned, and positioned; generating a second simulation model by performing a second simulation different from the first simulation on the sample macro; and comparing the first and second simulation models and extracting at least some of the plurality of patterns of the sample macro to construct a monitoring macro.