OPC OPC Design method for mask layout OPCOptical Proximity Correction method and methods for manufacturing mask using the OPC method

摘要

The technical idea of the present invention is a mask layout design method, an OPC method, and a mask using the OPC method, which can effectively control a corner notch of a rectangular notch in a multi-height cell and realize a multi-height cell as one mask. Provide a manufacturing method. The mask layout design method is a layout design method for a pattern on a mask for forming a target pattern of a multi-height cell including a rectangular notch portion, which corresponds to the notch portion. Design a layout including a hexagonal notch design in which at least one side of the rectangular pattern on the mask is transformed into a hexagonal pattern.