首页> 外国专利> POLISHING HEAD FOR FACE-UP TYPE POLISHING APPARATUS POLISHING APPARATUS INCLUDING THE POLISHING HEAD AND POLISHING METHOD USING THE POLISHING APPARATUS

POLISHING HEAD FOR FACE-UP TYPE POLISHING APPARATUS POLISHING APPARATUS INCLUDING THE POLISHING HEAD AND POLISHING METHOD USING THE POLISHING APPARATUS

机译:面朝上式抛光装置的抛光头包括抛光头的抛光装置和使用该抛光装置的抛光方法

摘要

The present invention provides a face-up polishing apparatus which supplies a polishing liquid without using a rotary joint. According to an embodiment of the present invention, a polishing head for a face-up polishing apparatus used by installing a polishing head on a lower surface thereof comprises: a liquid reservoir unit arranged around a rotary shaft of the polishing head to receive a liquid; and a liquid outlet arranged on a lower surface of the polishing head to discharge the liquid received by the liquid reservoir unit. An annular opening is formed on an upper portion of the polishing head around the rotary shaft of the polishing head. The liquid reservoir unit communicates with a space outside the polishing head through the opening.
机译:本发明提供一种不使用旋转接头而供给研磨液的面朝上的研磨装置。根据本发明的实施例,一种用于通过将抛光头安装在其下表面上而使用的面朝上抛光设备的抛光头,包括:储液单元,其围绕抛光头的旋转轴布置以接收液体;液体出口设置在抛光头的下表面上,以排出储液单元所接收的液体。围绕抛光头的旋转轴在抛光头的上部上形成环形开口。储液单元通过开口与抛光头外部的空间连通。

著录项

  • 公开/公告号KR20190083970A

    专利类型

  • 公开/公告日2019-07-15

    原文格式PDF

  • 申请/专利权人 EBARA CORPORATION;

    申请/专利号KR20180162907

  • 发明设计人 KOBAYASHI KENICHI;TOGAWA TETSUJI;

    申请日2018-12-17

  • 分类号B24B37/11;B24B37/04;B24B57/02;H01L21/304;H01L21/306;

  • 国家 KR

  • 入库时间 2022-08-21 11:50:22

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