- METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LITHOGRAPHY MASK TO A FLUCTUATION OF THE LINEWIDTH

摘要

Objectives of the present invention are to provide a method for determining a structure-independent contribution of a lithography mask to variation of line width, and a measuring system to execute the method. According to the present invention, in the method, in order to determine a structure-independent contribution of a lithography mask (5) to the variation in a line width, a recorded 2D intensity distribution (15_zi) of an unstructured measurement area of the lithography mask (5) is evaluated in a spatially disintegrated manner.