首页> 外国专利> PN PN JUNCTION DIODE BASED ON TRANSITION METAL DICHALCOGENIDES AND METAL OIXDE SEMICONDUCTORS AND METHOD OF MANUFACTURING THE SAME

PN PN JUNCTION DIODE BASED ON TRANSITION METAL DICHALCOGENIDES AND METAL OIXDE SEMICONDUCTORS AND METHOD OF MANUFACTURING THE SAME

机译:基于过渡金属二硫化物和金属氧化物半导体的PN PN结二极管及其制造方法

摘要

The present invention discloses a PN junction diode using a heterojunction of a transition metal dicalcogenide and a metal oxide semiconductor, and a manufacturing method thereof. A PN junction diode according to an embodiment of the present invention includes a substrate; A transition metal dicalcogenide layer formed on the substrate and operating as a p-type semiconductor; A metal oxide semiconductor layer having a larger energy bandgap than the transition metal decalcogenide layer and formed in a predetermined pattern on the transition metal decalcogenide layer and operating as an n-type semiconductor; A first electrode formed on the transition metal decalcogenide layer; And a second electrode formed on the metal oxide semiconductor layer. The charge separation is induced by controlling an energy band gap between the transition metal decalcogenide layer and the metal oxide semiconductor layer.
机译:本发明公开了一种使用过渡金属双钙化物和金属氧化物半导体的异质结的PN结二极管及其制造方法。根据本发明实施例的PN结二极管包括基板;在衬底上形成并用作p型半导体的过渡金属双钙化物层;具有大于过渡金属脱钙化物层的能带隙并且以预定图案形成在过渡金属脱钙化物层上并且用作n型半导体的金属氧化物半导体层;第一电极形成在过渡金属脱钙剂层上;第二电极形成在金属氧化物半导体层上。通过控制过渡金属脱钙化物层和金属氧化物半导体层之间的能带隙来引起电荷分离。

著录项

  • 公开/公告号KR101916998B1

    专利类型

  • 公开/公告日2019-01-30

    原文格式PDF

  • 申请/专利权人 연세대학교 산학협력단;

    申请/专利号KR20160050907

  • 发明设计人 김형준;박규남;고경용;

    申请日2016-04-26

  • 分类号H01L29/66;H01L21/28;H01L21/285;H01L29/51;

  • 国家 KR

  • 入库时间 2022-08-21 11:49:26

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