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NICKEL OXIDE FILM AND PREPARATION METHOD THEREFOR, FUNCTIONAL MATERIAL, MANUFACTURING METHOD FOR FILM STRUCTURE AND ELECTROLUMINESCENT DEVICE
NICKEL OXIDE FILM AND PREPARATION METHOD THEREFOR, FUNCTIONAL MATERIAL, MANUFACTURING METHOD FOR FILM STRUCTURE AND ELECTROLUMINESCENT DEVICE
The invention provides nickel oxide films and preparation method thereof, functional materials, method for fabricating film structures, and electroluminescent devices. The nickel oxide film includes: a nickel oxide film layer; organic molecules having electron withdrawing groups, the organic molecules being bonded to and disposed on the surface of the nickel oxide film layer. Due to the presence of the organic molecules having electron withdrawing groups, a reverse electric field of nickel oxide is formed on the surface of the nickel oxide, thereby improving the surface work function of the nickel oxide film. Further, when the nickel oxide film of the present application having a high surface work function is applied to the QLED device and the OLED device, the hole injection rate can be improved, thereby avoiding the use of PEDOT: PSS which is harmful to the device for improving the performance and stability of the device.
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