首页> 外国专利> NICKEL OXIDE FILM AND PREPARATION METHOD THEREFOR, FUNCTIONAL MATERIAL, MANUFACTURING METHOD FOR FILM STRUCTURE AND ELECTROLUMINESCENT DEVICE

NICKEL OXIDE FILM AND PREPARATION METHOD THEREFOR, FUNCTIONAL MATERIAL, MANUFACTURING METHOD FOR FILM STRUCTURE AND ELECTROLUMINESCENT DEVICE

机译:氧化镍膜及其制备方法,膜结构和电致发光器件的用途,功能材料,制造方法

摘要

The invention provides nickel oxide films and preparation method thereof, functional materials, method for fabricating film structures, and electroluminescent devices. The nickel oxide film includes: a nickel oxide film layer; organic molecules having electron withdrawing groups, the organic molecules being bonded to and disposed on the surface of the nickel oxide film layer. Due to the presence of the organic molecules having electron withdrawing groups, a reverse electric field of nickel oxide is formed on the surface of the nickel oxide, thereby improving the surface work function of the nickel oxide film. Further, when the nickel oxide film of the present application having a high surface work function is applied to the QLED device and the OLED device, the hole injection rate can be improved, thereby avoiding the use of PEDOT: PSS which is harmful to the device for improving the performance and stability of the device.
机译:本发明提供氧化镍膜及其制备方法,功能材料,膜结构的制造方法和电致发光器件。氧化镍膜包括:氧化镍膜层;和具有吸电子基团的有机分子,有机分子键合并布置在氧化镍膜层的表面上。由于具有吸电子基团的有机分子的存在,在氧化镍的表面上形成了氧化镍的反向电场,从而改善了氧化镍膜的表面功函数。此外,当将具有高表面功函数的本申请的氧化镍膜应用于QLED器件和OLED器件时,可以提高空穴注入速率,从而避免使用对器件有害的PEDOT:PSS。用于提高设备的性能和稳定性。

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