首页> 外国专利> A method for growing a beta-phase gallium oxide (β-Ga2O3) single crystal from a metal contained in a metal crucible.

A method for growing a beta-phase gallium oxide (β-Ga2O3) single crystal from a metal contained in a metal crucible.

机译:一种由金属坩埚中所含的金属生长β相氧化镓(β-Ga2O3)单晶的方法。

摘要

PROBLEM TO BE SOLVED: To provide a condition for growing a β-Ga2O3 single crystal from a melt, which minimizes Ga2O3 decomposition and eliminates damage to a metal crucible. A growth atmosphere supplied to a growth furnace has an oxygen concentration in the concentration range of less than the melting temperature (MT) or melting temperature (MT) of Ga2O3, or 5 to 100% by volume after complete melting of the Ga2O3 starting material. It has a variable oxygen concentration or partial pressure to reach the growth oxygen concentration values (C2, C2', C2'') at (SC), which is the co-production of the amount of metallic gallium and the resulting metal pot. Fitted to minimize crystallization. During the crystal growth step of the β-Ga2O3 single crystal from the melt at the growth temperature (GT), the growth oxygen concentration values (C2, C2', C2'') are maintained within the above oxygen concentration range (SC). Conditions for growing a β-Ga2O3 single crystal. [Selection diagram] Fig. 2
机译:要解决的问题:为从熔体中生长β-Ga2O3单晶提供条件,该条件可最大程度地减少Ga2O3分解并消除对金属坩埚的损坏。供给至生长炉的生长气氛的氧浓度的浓度范围小于Ga 2 O 3的熔融温度(MT)或熔融温度(MT),或者在Ga 2 O 3原料完全熔融后为5〜100体积%。它具有可变的氧浓度或分压,以达到(SC)处的生长氧浓度值(C2,C2',C2''),这是金属镓和所得金属罐的量的共同产生。适合最小化结晶。在生长温度(GT)下从熔体开始的β-Ga2O3单晶的晶体生长步骤中,生长氧浓度值(C2,C2',C2'')保持在上述氧浓度范围(SC)内。生长β-Ga2O3单晶的条件。 [选择图]图2

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