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Substrate cleaning apparatus, cleaning tool and substrate processing apparatus, and method of removing, attaching and replacing cleaning tool

机译:基板清洁设备,清洁工具和基板处理设备,以及拆卸,安装和更换清洁工具的方法

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning device which enables a cleaning tool to be easily replaced without contaminating a surface of the cleaning tool and the cleaning tool, and to provide detachment, attachment and replacement methods of the cleaning tool.SOLUTION: According to one embodiment of the invention, a substrate cleaning device includes: a roll type first cleaning tool having a first cleaning member, a first shaft and a second shaft; a holding member having a first shaft holder, which detachably fixes the first shaft, and a second shaft holder, which detachably fixes the second shaft, the holding member configured to make a distance between the first shaft holder and the second shaft holder variable and used to hold the first cleaning tool; a driving mechanism for moving the holding member; hook members which allow the first cleaning tool to be placed thereon and are used to detach the first cleaning tool from the holding member; and a standby stand which allows a roll type second cleaning tool, which has a second cleaning member, a third shaft and a fourth shaft, to be placed thereon and is used to attach the second cleaning tool to the holding member.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种基板清洁装置,该装置可使清洁工具易于更换而不会污染清洁工具和清洁工具的表面,并提供清洁工具的拆卸,安装和更换方法。根据本发明的一个实施例,一种基板清洁装置包括:辊式第一清洁工具,其具有第一清洁构件,第一轴和第二轴;以及保持构件具有:第一轴保持器,其可拆卸地固定第一轴;以及第二轴保持器,其可拆卸地固定第二轴;保持构件,其构造成使第一轴保持器和第二轴保持器之间的距离可变。握住第一个清洁工具;驱动机构,用于使保持部件移动。钩构件,其允许将第一清洁工具放置在其上,并且用于将第一清洁工具与保持构件分离。备用支架允许将辊式第二清洁工具放置在其上,该清洁工具具有第二清洁构件,第三轴和第四轴,并用于将第二清洁工具连接到保持构件。 1个

著录项

  • 公开/公告号JP6632900B2

    专利类型

  • 公开/公告日2020-01-22

    原文格式PDF

  • 申请/专利权人 株式会社荏原製作所;

    申请/专利号JP20160017766

  • 发明设计人 渡邉 博光;

    申请日2016-02-02

  • 分类号H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:16

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