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Multi-layer cooling structure including through-silicon vias through a plurality of directly-bonded substrates and methods of making the same

机译:包括穿过多个直接键合衬底的硅通孔的多层冷却结构及其制造方法

摘要

A multi-layer cooling structure comprising a first substrate layer comprising an array of cooling channels, a second substrate layer comprising a nozzle structure that includes one or more nozzles, an outlet, and an outlet manifold, a third substrate layer comprising an inlet manifold and an inlet, and one or more TSVs disposed through the first substrate layer, second substrate layer, and third substrate layer. At least one of the one or more TSVs is metallized. The first substrate layer and the second substrate layer are directly bonded, and the second substrate layer and the third substrate layer are directly bonded.
机译:多层冷却结构,其包括:第一基底层,其包括冷却通道阵列;第二基底层,其包括具有一个或多个喷嘴的喷嘴结构;出口;和出口歧管;第三基底层,其包括入口歧管和入口,以及一个或多个贯穿第一衬底层,第二衬底层和第三衬底层的TSV。一个或多个TSV中的至少一个被金属化。第一基板层和第二基板层直接结合,第二基板层和第三基板层直接结合。

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