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METHOD OF MONITORING SURFACE TEMPERATURES OF WAFERS IN REAL TIME IN SEMICONDUCTOR WAFER CLEANING APPARATUS AND TEMPERATURE SENSOR FOR MEASURING SURFACE TEMPERATURES OF WAFER
METHOD OF MONITORING SURFACE TEMPERATURES OF WAFERS IN REAL TIME IN SEMICONDUCTOR WAFER CLEANING APPARATUS AND TEMPERATURE SENSOR FOR MEASURING SURFACE TEMPERATURES OF WAFER
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机译:在半导体晶片清洁装置中实时监测晶片表面温度的方法和用于测量晶片表面温度的温度传感器
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摘要
A method of monitoring the surface temperatures of wafers in real time by measuring them according to the present invention monitors the surface temperatures of a polishing pad in real time by measuring them, and can thus actively deal with irregular variations in temperature on the surface of the wafer attributable to chemical reaction and friction in the process of cleaning the wafer. A sensor for measuring the surface temperatures of a wafer according to the present invention can be used in an environment in which there is fume generated from a cleaning solution, and is responsible for temperatures at respective points of an infrared camera and allows the correction of temperatures in respective sections.
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