首页> 外国专利> TWO-DIMENSIONAL ELECTROSTRICTIVE FIELD EFFECT TRANSISTOR (2D-EFET)

TWO-DIMENSIONAL ELECTROSTRICTIVE FIELD EFFECT TRANSISTOR (2D-EFET)

机译:二维电场效应晶体管(2D-EFET)

摘要

A device and method for manufacturing a two-dimensional electrostrictive field effect transistor having a substrate, a source, a drain, and a channel disposed between the source and the drain. The channel is a two-dimensional layered material and a gate proximate the channel. The gate has a column of an electrostrictive or piezoelectric or ferroelectric material, wherein an electrical input to the gate produces an elongation of the column that applies a force or mechanical stress on the channel and reduces a bandgap of two-dimensional material such that the two-dimensional electrostrictive field effect transistor operates with a subthreshold slope that is less than 60 mV/decade.
机译:一种用于制造二维电致伸缩场效应晶体管的设备和方法,该晶体管具有衬底,源极,漏极以及设置在源极和漏极之间的沟道。通道是二维分层材料,并且是靠近通道的栅极。栅极具有一列电致伸缩或压电或铁电材料,其中到栅极的电输入产生该列的伸长,该伸长在通道上施加力或机械应力并减小二维材料的带隙,使得两者维电致伸缩场效应晶体管的亚阈值斜率小于60 mV /十倍频。

著录项

  • 公开/公告号US2020335637A1

    专利类型

  • 公开/公告日2020-10-22

    原文格式PDF

  • 申请/专利权人 THE PENN STATE RESEARCH FOUNDATION;

    申请/专利号US202016916454

  • 发明设计人 SAPTARSHI DAS;

    申请日2020-06-30

  • 分类号H01L29/84;H01L29/66;H01L29/51;H01L29/24;H01L29/76;H01L29/778;H01L29/10;

  • 国家 US

  • 入库时间 2022-08-21 11:24:18

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