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SEMICONDUCTOR DEVICE, DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR DEVICE, DISPLAY MODULE INCLUDING THE DISPLAY DEVICE, AND ELECTRONIC APPLIANCE INCLUDING THE SEMICONDUCTOR DEVICE, THE DISPLAY DEVICE, AND THE DISPLAY MODULE
SEMICONDUCTOR DEVICE, DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR DEVICE, DISPLAY MODULE INCLUDING THE DISPLAY DEVICE, AND ELECTRONIC APPLIANCE INCLUDING THE SEMICONDUCTOR DEVICE, THE DISPLAY DEVICE, AND THE DISPLAY MODULE
A change in electrical characteristics is inhibited and reliability is improved in a semiconductor device using a transistor including an oxide semiconductor. One embodiment of a semiconductor device including a transistor includes a gate electrode, first and second insulating films over the gate electrode, an oxide semiconductor film over the second insulating film, and source and drain electrodes electrically connected to the oxide semiconductor film. A third insulating film is provided over the transistor and a fourth insulating film is provided over the third insulating film. The third insulating film includes oxygen. The fourth insulating film includes nitrogen. The amount of oxygen released from the third insulating film is 1×1019/cm3 or more by thermal desorption spectroscopy, which is estimated as oxygen molecules. The amount of oxygen molecules released from the fourth insulating film is less than 1×1019/cm3.
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机译:在使用包括氧化物半导体的晶体管的半导体器件中,抑制了电特性的变化并且提高了可靠性。包括晶体管的半导体器件的一个实施例包括栅电极,在栅电极之上的第一和第二绝缘膜,在第二绝缘膜之上的氧化物半导体膜以及电连接到氧化物半导体膜的源极和漏极。在晶体管上方设置第三绝缘膜,并且在第三绝缘膜上方设置第四绝缘膜。第三绝缘膜包括氧。第四绝缘膜包括氮。通过热解吸光谱法,从第三绝缘膜释放的氧的量为1×10 19 Sup> / cm 3 Sup>或更多,估计为氧分子。从第四绝缘膜释放的氧分子的量小于1×10 19 Sup> / cm 3 Sup>。
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