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LITHOGRAPHIC MASK CORRECTION USING VOLUME CORRECTION TECHNIQUES
LITHOGRAPHIC MASK CORRECTION USING VOLUME CORRECTION TECHNIQUES
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机译:使用体积校正技术进行光刻掩膜校正
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摘要
A method of making a mask includes computing a mask volume correction matrix for a given mask layout to be used to perform a lithography process. The mask volume correction matrix represents a diffraction field for a predetermined thickness of a material of the mask. A simulated mask pattern is computed by applying the mask volume correction matrix to the given mask layout. The simulated mask pattern is provided to a mask making tool.
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