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FORMULATION AND PROCESSING SOLUTION FOR DICING PROCESS, AND METHOD FOR PROCESSING

机译:切丁过程的配方和加工溶液及加工方法

摘要

A formulation for a wafer dicing process comprises 1.0 to 1.5 mass % of a partially saponified polyvinyl alcohol having a polymerization degree of 200 to 400 and a saponification degree of 75 to 85 mol %; 0.4 to 0.6 mass % of polyoxyethylene-polyoxypropylene glycol ether having a number average molecular weight of 10,000 to 20,000 with a polymerization ratio of polyoxyethylene to polyoxypropylene of 75:25 to 85:15; and pure water (all mass % based on 100 mass % of formulation). The formulation is used in the form of a processing solution obtained by diluting it 10,000 to 100,000 times by pure water and flowing it on a dicing blade in a wafer dicing process to effectively remove dicing offcuts from the wafer and minute pieces of adhesive released from an adhesive layer of a dicing tape.
机译:用于晶片切割工艺的制剂包含1.0至1.5质量%的部分皂化的聚乙烯醇,其具有200至400的聚合度和75至85mol%的皂化度;和0.4至0.6质量%的数均分子量为10,000至20,000的聚氧乙烯-聚氧丙二醇醚,聚氧乙烯与聚氧丙烯的聚合比为75:25至85:15;和纯水(所有质量%基于配方的100质量%)。该制剂以加工溶液的形式使用,该溶液通过用纯水稀释10,000至100,000次并将其在晶片切割过程中流到切割刀片上而有效地去除晶片上的切割残渣和从晶片上释放的微小粘合剂。切割胶带的粘合层。

著录项

  • 公开/公告号US2020075413A1

    专利类型

  • 公开/公告日2020-03-05

    原文格式PDF

  • 申请/专利权人 NIKKA SEIKO CO. LTD.;

    申请/专利号US201916542768

  • 申请日2019-08-16

  • 分类号H01L21/78;C08L29/04;H01L21/683;

  • 国家 US

  • 入库时间 2022-08-21 11:19:10

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