APPARATUS FOR GUIDING DRIER FOR SEMICONDUCTOR WAFER

摘要

The present invention relates to an apparatus for guiding a drier for a semiconductor wafer. When, in order to dry a semiconductor wafer, the semiconductor wafer is processed with a chemical solution such as a cleaning solution washed with DI water and moved from a rinsing bath to a drying bath for Marangoni drying while ascending/descending, a wafer guide device is provided on the internal circumferential surface of the rinsing bath so as to prevent wafers from sticking to each other due to a surface tension gradient while the wafers are out of the water surface, wherein the wafers are finely twisted or bent during a process of using a memory device, the process including many 3D processes having a large warpage, or a process of reclaiming the wafer. Therefore, damage to normal wafers due to fine twisting or bending of the wafers may be prevented.