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SUPPORTING STRUCTURE FOR CHEMICAL MECHANICAL POLISHING EQUIPMENT, AND CHEMICAL MECHANICAL POLISHING EQUIPMENT
SUPPORTING STRUCTURE FOR CHEMICAL MECHANICAL POLISHING EQUIPMENT, AND CHEMICAL MECHANICAL POLISHING EQUIPMENT
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机译:化学机械抛光设备的支撑结构以及化学机械抛光设备
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摘要
Disclosed are a supporting structure for chemical mechanical polishing equipment and the chemical mechanical polishing equipment. The supporting structure comprises a polishing head frame body (1), wherein the polishing head frame body (1) comprises multiple supports (11) intersecting at the center of the polishing head frame body (1), and a center column (2) located at the center of the polishing head frame body (1) and connected to the polishing head frame body (1); one end, away from the center of the polishing head frame body (1), of each support (11) is connected to an edge supporting piece (3); the edge supporting piece (3) is configured to cooperate with the center column (2) to support the polishing head frame body (1); a working area (8) configured to place a polishing workbench therein is formed between the edge supporting piece (3) and the center column (2); each support (11) is provided with moving rails (12) extending to the center of the polishing head frame body (1); and in the extending direction of each moving rail (12), a gap is formed between the end part of one end, close to the center column (2), of the moving rail (12) and the center column (2) to form a polishing head module replacing area (5). The supporting structure for the chemical mechanical polishing equipment and the chemical mechanical polishing equipment have a simple structure, can disperse the load of the center column, and prolong the service life of the polishing head frame body.
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