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Method for Preparing Oxide Thin Transistor and Oxide Thin Transistor Prepared by Using the Same
Method for Preparing Oxide Thin Transistor and Oxide Thin Transistor Prepared by Using the Same
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机译:氧化物薄膜晶体管的制备方法及使用该方法制备的氧化物薄膜晶体管
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摘要
The present invention, Forming a gate insulating film on the substrate on which the gate electrode is formed; Performing a plasma treatment process on the gate insulating film; Forming an oxide semiconductor thin film by applying an oxide semiconductor solution on the gate insulating film; Forming a source electrode and a drain electrode electrically connected to the oxide semiconductor thin film; An oxide thin film transistor manufacturing method and an oxide thin film transistor manufactured by the manufacturing method may include not only having excellent flatness and reliability, but also large-scale production of wafer units, and an oxide thin film transistor having excellent reproducibility through a batch process. to provide.
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