Substrate processing chamber with improved process volume sealing

摘要

Embodiments of process chambers are provided herein. In some embodiments, the process chamber includes: a chamber wall defining an inner volume within the process chamber; A substrate support disposed within the inner volume, having a support surface for supporting the substrate, the inner volume comprising a processing volume disposed above the support surface and a non-processing volume at least partially disposed below the support surface; A gas supply plenum fluidly coupled to the processing volume through a gas supply channel disposed over the support surface; A pumping plenum fluidly coupled to the processing volume through an exhaust channel disposed over the support surface; And a sealing device configured to fluidly isolate the processing volume from the non-processing volume when the substrate support is in the processing position, and when the substrate support is in the non-processing position, the processing volume and the non-processing volume are fluid. It is coupled.