ORGANOAMINOSILANE PRECURSOR AND METHOD FOR PREPARING AND USING SAME

摘要

The present invention relates to an organoaminosilane precursor which can be used to deposit a silicon-containing film, and to a method for preparing the precursor. Also, the present invention relates to the silicon-containing film or a deposition method to prepare the silicon-containing film by using the organoaminosilane precursor described herein. Moreover, the present invention relates to a container comprising the organoaminosilane precursor or a composition thereof which can be used, for example, to transmit the precursor to a reactor to deposit the silicon-containing film. The organoaminosilane is represented by one of chemical formulas A, B, or C.;COPYRIGHT KIPO 2020